Accurate overlay control for 0.30-ヲフm i-line lithography
- 著者名:
- Kim,K.-Y. ( Hyundai Electronics Industries Co.,Ltd. )
- Hur,I.-B.
- Jang,G.-J.
- Choi,S.-H.
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2725
- 発行年:
- 1996
- 開始ページ:
- 379
- 終了ページ:
- 387
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421012 [0819421014]
- 言語:
- 英語
- 請求記号:
- P63600/2725
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
8
国際会議録
Simulation and modeling of electron-beam lithography for delineating 0.2-ヲフm line and space patterns
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
11
国際会議録
Practical implementation of top-surface imaging process by silylation to sub-0.20-ヲフm lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
MRS - Materials Research Society |