Water-soluble resist for environmentally friendly lithography
- 著者名:
Lin,Q. ( Univ.of Texas/Austin ) Simpson,L.L. Steinhausler,T. Wilder,M. Willson,C.G. Havard,J. Frechet,J.M.J. - 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2725
- 発行年:
- 1996
- 開始ページ:
- 308
- 終了ページ:
- 318
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421012 [0819421014]
- 言語:
- 英語
- 請求記号:
- P63600/2725
- 資料種別:
- 国際会議録
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12
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Deprotection volume characteristics and line-edge morphology in chemcially amplified resists
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