Sub-0.25-ヲフm defect analysis on 200-mm semiconductor wafers
- 著者名:
- Childs,K.D. ( Physical Electronics,Inc. )
- Paul,D.F.
- Clough,S.P.
- 掲載資料名:
- Metrology, Inspection, and Process Control for Microlithography X
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2725
- 発行年:
- 1996
- 開始ページ:
- 255
- 終了ページ:
- 260
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421012 [0819421014]
- 言語:
- 英語
- 請求記号:
- P63600/2725
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
6
国際会議録
Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ヲフm Technology
MRS - Materials Research Society |
MRS - Materials Research Society |