Effects of PE-TEOS process on O3-TEOS characteristics and device reliability

Effects of PE-TEOS process on O3-TEOS characteristics and device reliability

著者名:

Jang,S.M. ( Taiwan Semiconductor Manufacturing Co. )

掲載資料名:

Microelectronic Device and Multilevel Interconnection Technology

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2636

発行年:

1995

開始ページ:

307

終了ページ:

316

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819420022 [0819420026]

言語:

英語

請求記号:

P63600/2636

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019786
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Microelectronic Manufacturing : Microelectronic Device and Multilevel Interconnection Technology
回次:	1995
会議開催地:	Austin, TX, USA
会議開催年:	1995.10.25-1995.10.26

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