Alkane Plasma Etching of Gallium Arsenide

Alkane Plasma Etching of Gallium Arsenide

著者名:

掲載資料名:

Plasma properties, deposition and etching

シリーズ名:

Materials science forum

シリーズ巻号:

140-142

発行年:

1993

開始ページ:

659

終了ページ:

688

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878496709 [087849670X]

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019749
シリーズID:	PA00000012

類似資料:

1 国際会議録 Time dependent diffusion of P-TYPE dopants in Gallium arsenide Robinson, H. G., Jones, K. S., Deal, M. D., Hu, C. J. MRS - Materials Research Society	7 国際会議録 Aspects of One Dimensional Transport Effects in Gallium Arsenide Heterojunvtion Structures Pepper M., Ford B. J. C., Smith G. C., Brown J. R., Kelly J. M., Newbury R., Ahmed H., Hasko G. D., Frost F. E. J., … Plenum Press
2 国際会議録 CH4:H2:Ar rf/ECR PLASMA ETCHING OF GaAs AND InP Law, Victor J., Ingram, S. G., Jones, G. A. C., Grimwood, R. C., Royal, H. Materials Research Society	8 国際会議録 McV IMPLANTATION OF GALLIUM ARSENIDE Kamber, H., Chen, J. C., Barger, M. J. Materials Research Society
3 国際会議録 Non-Crystallographic Wet Etching of Gallium Arsenide Baca, A.G., Laroche, J.R., Chang, P.C., Ren, F. Electrochemical Society	9 国際会議録 ASSESSMENT OF SURFACE DAMAGE OF GALLIUM ARSENIDE DUE TO REACTIVE ION ETCHING Puttock, M. S., Thomas, H., Morgan, D. V., Rossow, U., Zahn, D. R. T., Richter, W., Hilton, K. P., Woodward, J. Materials Research Society
4 国際会議録 LASER-ASSITED LOCAL ETCHING OF GALLIUM ARSENIDE Takai, M., Tokuda, J., Nakai, H., Gamo, K., Namba, S. North-Holland	10 国際会議録 FS Spectroscopy of Phonon Emission and Absorption for a Cold Plasma in Gallium Arsenide Agnesi, A., Cavalleri, A., Malvezzi, A. M., Reali, G. C. MRS - Materials Research Society
5 国際会議録 Modeling dopant diffusion in Gallium arsenide Deal, M. D., Hu, C. J., Lee, C. C., Robinson, H. G. MRS - Materials Research Society	11 国際会議録 OPTICAL, CHEMICAL AND ELECTRICAL CHARACTERIZATION OF ION-ETCHED GALLIUM ARSENIDE SURFACES Feng, G. F., Holtz, M., Zallen, R., Epp. J. M., Dillard, J. G., Cole, E., Johnson, P., Sen, S., Burton, L. C. Materials Research Society
6 国際会議録 BURIED AMORPHOUS LAYER IN GALLIUM ARSENIDE Sengupta, D., Ridgway, M.C., Zemanski, J.M., Johnson, S.T. Materials Research Society	12 国際会議録 Plasma Etching for the Application to Low-K Dielectrics Devices J.W. Lee, H.W. Kim, J.W. Han, M.S. Kim, B.D. Yoo, M.H. Kim, C.H. Lee, C.H. Lim, S.K. Hwang, C. Lee, D.J. Chung, S.G. … Trans Tech Publications

1

2

3

4

5

6

7

8

9

10

11

12