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Plasma-Enhanced Metalorganic Chemical Vapor Deposition for High Temperature Superconducting Thill Film

著者名:
掲載資料名:
Plasma properties, deposition and etching
シリーズ名:
Materials science forum
シリーズ巻号:
140-142
発行年:
1993
開始ページ:
457
終了ページ:
464
出版情報:
Aedermannsdorf, Switzerland: Trans Tech Publications
ISSN:
02555476
ISBN:
9780878496709 [087849670X]
言語:
英語
請求記号:
M23650
資料種別:
国際会議録

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