Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films

Biased Electron Cyclotron Resonance Chemical-Vapor Deposition of Silicon Dioxide Inter-Metal Dielectric Thin Films

著者名:

掲載資料名:

Plasma properties, deposition and etching

シリーズ名:

Materials science forum

シリーズ巻号:

140-142

発行年:

1993

開始ページ:

255

終了ページ:

268

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878496709 [087849670X]

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019749
シリーズID:	PA00000012

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