Modified ECR Plasma Deposition

Modified ECR Plasma Deposition

著者名:

掲載資料名:

Plasma properties, deposition and etching

シリーズ名:

Materials science forum

シリーズ巻号:

140-142

発行年:

1993

開始ページ:

79

終了ページ:

88

出版情報:

Aedermannsdorf, Switzerland: Trans Tech Publications

ISSN:

02555476

ISBN:

9780878496709 [087849670X]

言語:

英語

請求記号:

M23650

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019749
シリーズID:	PA00000012

類似資料:

1 国際会議録 HIGH RATE DEPOSITION OF HYDROGENATED AMORPHOUS SILICON FILMS BY ECR PLASMA CVD Ozaki, S., Akahori, T., Tani, T., Nakayama, S. Materials Research Society	7 国際会議録 PROPERTIES OF Si02 FILMS FABRICATED BY MICROWAVE ECR PLASMA PROCESSING WITH AND WITHOUT ENERGETIC PARTICLE BOMBARDMENT DURING FILM DEPOSITION PART I. … Chau, T. T., Mejia, S. R., Kao, K. C. Materials Research Society
2 国際会議録 PLASMA PARAMETER AND FILM QUALITY IN THE ECR-PLASMA-CVD Nakayama, Y., Kondoh, M., Hitsuishi, K, Kawamura, T. Materials Research Society	8 国際会議録 Deposition of High Quality SiO2 Films Using TEOS by ECR Plasma Sano, K., Tamamaki, H., Nomura, M., Wickramanayaka, S., Nakanishi, Y., Hatanaka, Y. MRS - Materials Research Society
3 国際会議録 A Study of Highly Selective Oxide Etching by ECR Plasma Katayama, K., Hisada, M., Nakamura, S., Fujiwara, H. Electrochemical Society	9 国際会議録 ECR plasma oxidation: Dependence on energy of argon ion Matsuo, S., Yamamoto, M., Sadoh, T., Tsurushima, T., Gao, D. W., Furukawa, K., Nakashima, H. MRS-Materials Research Society
4 国際会議録 SYNTHESIS OF HIGHLY PHOTOSENSITIVE a-SiC:H FILMS AT HIGH DEPOSITION RATE BY PLASMA DECOMPOSITION OF SiH4 AND C2H2 Nakayama, Y., Akita, S., Wakita, K., Kawamura, T. Materials Research Society	10 国際会議録 Low-Energy Deposition of High-Strength Al(O) Alloys from an ECR Plasma Barbour, J. C., Follstaedt, D. M., Knapp, J. A., Marshall, D. A., Myers, S. M., Lad, R. J. MRS - Materials Research Society
5 国際会議録 AIN Epitaxial Films Grown by ECR Plasma Assisted Metalorganic Chemical Vapor Deposition under Controlled Plasma Conditions in Afterglow Region Yasui, K., Hoshino, S., Akahane, T. Trans Tech Publications	11 国際会議録 ECR OXYGEN PLASMA CLEANING OF OXIDE ETCHED SURFACES Mikulan, P.I., Fonash, S.J., Reinhardt, K.A., Ta, T. Electrochemical Society
6 国際会議録 PROPERTIES OF SiO2 FILMS FABRICATED BY MICROWAVE ECR PLASMA PROCESSING WITH AND WITHOUT ENERGETIC PARTICLE BOMBARDMENT DURING FILM DEPOSITION. PART II: … Chau, T. T., Mejia, S. R., Kao, K. C. Materials Research Society	12 国際会議録 ECR, ICP and RIE plasma etching of GaN Shul, R.J., McClellan, G.B., Rieger, D.J., Hafich, M.J., Drummond, T.J., Pearton, S.J., Abernathy, C.R., Constantine, … Electrochemical Society

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