Laser excitation of thermal waves for remote control of Si wafers in plasma-etching process

Laser excitation of thermal waves for remote control of Si wafers in plasma-etching process

著者名:

Karabutov,A.A. ( Moscow State Univ.(Russia) )
Klevitskii,V.V. ( Moscow State Univ.(Russia) )
Kubyshkin,A.P. ( Scientific Research Ctr.for Laser Technology (Russia) )
Panchenko,V.Ya. ( Scientific Research Ctr.for Laser Technology (Russia) )

掲載資料名:

Laser applications engineering (LAE-96) : 3-5 July, 1996, St. Petersburg-Pushkin, Russia

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3091

発行年:

1997

開始ページ:

83

終了ページ:

89

出版情報:

Bellingham, Wash.: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819425065 [0819425060]

言語:

英語

請求記号:

P63600/3091

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016473
シリーズID:	PA00000029
会議名:	International Conference on Laser Applications Engineering - LAE
回次:	1996 : 8th
会議開催地:	St. Petersburg-Pushkin, Russia
会議開催年:	2001.07.03-2001.07.05

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