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Diffusion in Cobalt Silicide During Silicide Formation

著者名:
掲載資料名:
Crucial issues in semiconductor materials and processing technologies
シリーズ名:
NATO ASI series. Series E, Applied sciences
シリーズ巻号:
222
発行年:
1992
開始ページ:
369
終了ページ:
374
総ページ数:
6
出版情報:
Dordrecht: Kluwer Academic Publishers
ISSN:
0168132X
ISBN:
9780792320036 [0792320034]
言語:
英語
請求記号:
N11482/222
資料種別:
国際会議録

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