Determination of residual stress and elastic constants of silicon open stencil masks for ion projection lithography

Determination of residual stress and elastic constants of silicon open stencil masks for ion projection lithography

著者名:

Degen,A. ( Univ.Kassel )

掲載資料名:

15th European Conference on Mask Technology for Integrated Circuits and Microcomponents '98 : 16-17 November 1998, Munich-Unterhaching, Germany

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3665

発行年:

1999

開始ページ:

113

終了ページ:

122

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431394 [0819431397]

言語:

英語

請求記号:

P63600/3665

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019463
シリーズID:	PA00000029
会議名:	European Mask and Lithography Conference : European Conference on Mask Technolong for Integrated Circuits and Microcomponents
回次:	1998 : 15th
会議開催地:	Munich-Unterhaching, Germany
会議開催年:	1998.11.16-1998.11.17

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