Comparison of ArF and KrF laser performance at 2 kHz for microlithography
- 著者名:
Besaucele,H. ( Cymer,Inc. ) Das,P.P. Duffey,T.P. Embree,T.J. Ershov,A.I. Fleurov,V.B. Grove,S.L. Melcher,P.C. Ness,R. Padmabandu,G.G. - 掲載資料名:
- Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4000
- 発行年:
- 2000
- 巻:
- Part2
- 開始ページ:
- 1476
- 終了ページ:
- 1480
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436184 [0819436186]
- 言語:
- 英語
- 請求記号:
- P63600/4000
- 資料種別:
- 国際会議録
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8
国際会議録
Extending the performance of KrF laser for microlithography by using novel F2 control technology
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |