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Application of attenuated phase-shift masks to sub-0.18-ヲフm logic patterns

著者名:
Fritze,M. ( MIT Lincoln Lab. )
Wyatt,P.W.
Astolfi,D.K.
Davis,P.
Curtis,A.V.
Preble,D.M.
Cann,S.G.
Denault,S.
Chan,D.
Shaw,J.C.
Sullivan,N.T.
Brandom,R.
Mastovich,M.E.
さらに 8 件
掲載資料名:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4000
発行年:
2000
巻:
Part2
開始ページ:
1179
終了ページ:
1192
出版情報:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
言語:
英語
請求記号:
P63600/4000
資料種別:
国際会議録

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