Application of attenuated phase-shift masks to sub-0.18-ヲフm logic patterns
- 著者名:
Fritze,M. ( MIT Lincoln Lab. ) Wyatt,P.W. Astolfi,D.K. Davis,P. Curtis,A.V. Preble,D.M. Cann,S.G. Denault,S. Chan,D. Shaw,J.C. Sullivan,N.T. Brandom,R. Mastovich,M.E. - 掲載資料名:
- Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4000
- 発行年:
- 2000
- 巻:
- Part2
- 開始ページ:
- 1179
- 終了ページ:
- 1192
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436184 [0819436186]
- 言語:
- 英語
- 請求記号:
- P63600/4000
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
2
国際会議録
Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
国際会議録
Mechanical Stresses in Aluminum and Copper Interconnect Lines for 0.18 ヲフm Logic Technologies
MRS - Materials Research Society |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
国際会議録
Evaluation of phase-edge phase-shifting mask for sub-0.18-ヲフm gate patterns in logic devices
SPIE-The International Society for Optical Engineering |