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Forbidden pitches for 130-nm lithography and below

著者名:
Socha,R.J. ( ASML MaskTools )
Dusa,M.V.
Capodieci,L.
Finders,J.
Chen,J.F.
Flagello,D.G.
Cummings,K.D.
さらに 2 件
掲載資料名:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4000
発行年:
2000
巻:
Part2
開始ページ:
1140
終了ページ:
1155
出版情報:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
言語:
英語
請求記号:
P63600/4000
資料種別:
国際会議録

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