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Application of chromeless phase-shift masks to sub-100-nm SOI CMOS transistor fabrication

著者名:
Fritze,M. ( MIT Lincoln Lab. )
Burns,J.M.
Wyatt,P.W.
Astolfi,D.K.
Forte,T.
Yost,D.
Davis,P.
Curtis,A.V.
Preble,D.M.
Cann,S.G.
Denault,S.
Liu,H.-Y.
Shaw,J.C.
Sullivan,N.T.
Mastovich,M.E.
さらに 10 件
掲載資料名:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4000
発行年:
2000
巻:
Part1
開始ページ:
388
終了ページ:
407
出版情報:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
言語:
英語
請求記号:
P63600/4000
資料種別:
国際会議録

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