Alt-PSM for 0.10-ヲフm and 0.13-ヲフm polypatterning
- 著者名:
- Schenker,R.E. ( Intel Corp. )
- Kirchauer,H.
- Stivers,A.R.
- Tejnil,E.
- 掲載資料名:
- Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 4000
- 発行年:
- 2000
- 巻:
- Part1
- 開始ページ:
- 112
- 終了ページ:
- 120
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819436184 [0819436186]
- 言語:
- 英語
- 請求記号:
- P63600/4000
- 資料種別:
- 国際会議録
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