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0.13-ｦﾌm optical lithography for random logic devices using 248-nm attenuated phase-shifting masks

著者名:
Chen,Y.T. ( Taiwan Semiconductor Manufacturing Co.,Ltd. )
Lin,C.H.
Lin,H.T.
Hsieh,H.C.
Yu,S.S.
Yen,A.
さらに 1 件
掲載資料名:
Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
4000
発行年:
2000
巻:
Part1
開始ページ:
99
終了ページ:
110
出版情報:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436184 [0819436186]
言語:
英語
請求記号:
P63600/4000
資料種別:
国際会議録

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