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*Chemical vapor deposition and electrode technologies for (Ba,Sr) TiO3 capacitor used in gigabit DRAM

著者名:
Eguchi, K.
Hieda, K.
Nakahira, J.
Kiyotoshi, M.
Nakabayashi, M.
Yamazaki, S.
Izuha, M.
Aoyama, T.
Tsunoda, K.
Lin, J.
Nakamura, K.
Niwa, S.
Tomita, H.
Shimada, A.
Kohyama, Y.
Ishibashi, Y.
Fukuzumi, Y.
Arikado, T.
Okumura, K.
さらに 14 件
掲載資料名:
Ferroelectric thin films VIII : symposium held November 29-December 2, 1999, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
596
発行年:
2000
開始ページ:
3
出版情報:
Warrendale, PA: MRS-Materials Research Society
ISSN:
02729172
ISBN:
9781558995048 [1558995048]
言語:
英語
請求記号:
M23500/596
資料種別:
国際会議録

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