GROWTH STRESS IN CVD-WGex FILMS DEPOSITED BY REDUCTION OF WF6 BY GeH4

GROWTH STRESS IN CVD-WGex FILMS DEPOSITED BY REDUCTION OF WF6 BY GeH4

著者名:

掲載資料名:

Thin films : stresses and mechanical properties IV : symposium held April 12-16, 1993, San Francisco, California, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

308

発行年:

1993

開始ページ:

27

出版情報:

Pittsburgh, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558992047 [1558992049]

言語:

英語

請求記号:

M23500/308

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019387
シリーズID:	PA00000011
会議名:	Symposium on thin films: stresses and mechanical properties
回次:	4th
会議開催地:	San Francisco, CA, USA
会議開催年:	1993.04.12-1993.04.16

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1 国際会議録 DEPOSIT OF TUNGSTEN ON SILICON DIOXIDE BY GeH4 REDUCTION OF WF6 Oosterlaken, T. G. M., Luisink, G. J., van der Leugd, C. A., Janssen, G. C. A. M, Radelaar, S. Materials Research Society	7 国際会議録 Isothermal Stress Relaxation in Al, AlCu and AlVPd Films Lokker, J. P., Jongste, J. F., Janssen, G. C. A. M., Radelaar, S. MRS - Materials Research Society
2 国際会議録 EVOLUTION OF INTRINSIC STRESS DURING NUCLEATION AND GROWTH OF POLYCRYSTALLINE TUNGSTEN FILMS BY CHEMICAL VAPOR DEPOSITION Leusink, G. J., Oosterlaken, T. G. M., Janssen, G. C. A.M., Radelaar, S. Materials Research Society	8 国際会議録 Isothermal Stress Relaxation in Al, AlCu and AlVPd Films Lokker, J. P., Jongste, J. F., Janssen, G. C. A. M., Radelaar, S. MRS - Materials Research Society
3 国際会議録 The Kinetics of Tungsten Deposition from a H2/WF6- Mixture Studied by In-Situ Laser Raman Scattering Oosterlaken, T.G.M., Leusink, G.J., Janssen, G.C.A.M., Radelaar, S. Electrochemical Society	9 国際会議録 In-situ wafer curvature measurements during rapid thermal annealing of Si(100)wafers Jongste,J.F., Oosterlaken,T.G.M., Bart,G.C.J., Janssen,G.C.A.M., Radelaar,S. SPIE-The International Society for Optical Engineering
4 国際会議録 THE INFLUENCE OF TEMPERATURE GRADIENTS ON PARTIAL PRESSURES IN A CVD REACTOR Oosterlaken, T. G. M., Leusink, G. J., Janssen, G. C. A. M., Radelaar, S., Kuijlaars, K. J., Kleijn, C. R., Akker, H. E. … MRS - Materials Research Society	10 国際会議録 IN SITU STRESS MEASUREMENTS DURING THE FORMATION OF TiSi2 C49 ON Si WAFERS Jongste, J. F., Janssen, G. C. A. M., Radelaar, S. Materials Research Society
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