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Evaluation of 2.0nm Grown and Deposited Dielectrics in 0.1ｦﾌm PMOSFETs

著者名:
Srivastava, A.
Heinisch, H. H.
Vogel, E.
Parker, C.
Osburn, C. M.
Masnari, N. A.
Wortman, J. J.
Hauser, J. R.
さらに 3 件
掲載資料名:
Rapid thermal and integrated processing VII : symposium held April 13-15, 1998, San Francisco, California, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
525
発行年:
1998
開始ページ:
163
出版情報:
Pittsburgh, PA: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994317 [1558994319]
言語:
英語
請求記号:
M23500/525
資料種別:
国際会議録

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