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Low-Temperature Remote-Plasma-Assisted Jet Vapor Deposition of Silicon Nitride

著者名:
Veteran, J.
Hobbs, C.
Hegde, R.
Tobin, P.
Wang, V.
Tseng, H.
Kenig, G.
Hartig, M.
Tamagawa, T.
Doran, R.
Makowicz, P.
Schmitt, J.
Halpern, B.
Zhang, J. Z.
さらに 9 件
掲載資料名:
Chemical aspects of electronic ceramics processing : symposium held November 30-December 4, 1997, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposium proceedings
シリーズ巻号:
495
発行年:
1998
開始ページ:
445
出版情報:
Warrendale, Pa.: MRS - Materials Research Society
ISSN:
02729172
ISBN:
9781558994003 [1558994009]
言語:
英語
請求記号:
M23500/495
資料種別:
国際会議録

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