Precursors for the Chemical Vapor Deposition of Titanium Nitride and Titanium Aluminum Nitride Films

Precursors for the Chemical Vapor Deposition of Titanium Nitride and Titanium Aluminum Nitride Films

著者名:

掲載資料名:

Chemical aspects of electronic ceramics processing : symposium held November 30-December 4, 1997, Boston, Massachusetts, U.S.A.

シリーズ名:

Materials Research Society symposium proceedings

シリーズ巻号:

495

発行年:

1998

開始ページ:

95

出版情報:

Warrendale, Pa.: MRS - Materials Research Society

ISSN:

02729172

ISBN:

9781558994003 [1558994009]

言語:

英語

請求記号:

M23500/495

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019379
シリーズID:	PA00000011
会議名:	Symposium on chemical aspects of electronic ceramics processing
回次:	1997
会議開催地:	Boston, MA, USA
会議開催年:	1997.11.30-1997.12.04

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