Low-Temperature Chemical Vapor Deposition of Titanium Dioxide Thin Films Using Tetranitratotitanium (IV)
- 著者名:
Gilmer, D. C. Gladfelter, W. L. Colombo, D. G. Taylor, C. J. Roberts, J. Campbell, S. A. Kim, H-S. Wilk, G. D. Gribelyuk, M. A. - 掲載資料名:
- Chemical aspects of electronic ceramics processing : symposium held November 30-December 4, 1997, Boston, Massachusetts, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 495
- 発行年:
- 1998
- 開始ページ:
- 45
- 出版情報:
- Warrendale, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558994003 [1558994009]
- 言語:
- 英語
- 請求記号:
- M23500/495
- 資料種別:
- 国際会議録
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6
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Chemical Vapor Deposition of Al Films from Dimethylethylamine Alane on GaAs(100)2。゚4 Surfaces
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