Measurement and Modeling of Intrinsic Stresses in CVD W Lines
- 著者名:
Lee, Jin Ma, Qing Marieb, Thomas Mack, Anne S. Fujimoto, Harry Flinn, Paul Woolery, Bruce Keys, Linda - 掲載資料名:
- Materials reliability in microelectronics V : symposium held April 17-21, 1995, San Francisco, California, U.S.A.
- シリーズ名:
- Materials Research Society symposium proceedings
- シリーズ巻号:
- 391
- 発行年:
- 1995
- 開始ページ:
- 115
- 出版情報:
- Pittsburgh, Pa.: MRS - Materials Research Society
- ISSN:
- 02729172
- ISBN:
- 9781558992948 [1558992944]
- 言語:
- 英語
- 請求記号:
- M23500/391
- 資料種別:
- 国際会議録
類似資料:
MRS - Materials Research Society |
MRS-Materials Research Society |
MRS - Materials Research Society |
MRS-Materials Research Society |
3
国際会議録
HIGH RESOLUTION OBSERVATION OF VOID MOTION IN PASSIVATED METAL LINES UNDER ELECTROMIGRATION STRESS
Materials Research Society |
9
国際会議録
The Effects of Passivation Thickness and Initial Aluminum Line Stress on Electromigration Behavior
MRS - Materials Research Society |
MRS - Materials Research Society |
10
国際会議録
*UNDERSTANDING VOID PHENOMENA IN METAL LINES: EFFECTS OF MECHANICAL AND ELECTROMIGRATION STRESS
Materials Research Society |
MRS - Materials Research Society |
11
国際会議録
PRINCIPLE AND APPLICATIONS OF WAFER CURVATURE TECHNIQUES FOR STRESS MEASUREMENTS IN THIN FILMS
Materials Research Society |
MRS - Materials Research Society |
MRS - Materials Research Society |