Negative resists for electron-beam lithography utilizing acid-catalyzed intramolecular dehydration of phenylcarbinol

Negative resists for electron-beam lithography utilizing acid-catalyzed intramolecular dehydration of phenylcarbinol

著者名:

Migitaka,S. ( Hitachi,Ltd. )

掲載資料名:

Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2724

発行年:

1996

開始ページ:

613

終了ページ:

619

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421005 [0819421006]

言語:

英語

請求記号:

P63600/2724

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019331
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Technology and Processing
回次:	1996 : 13th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1996.03.11-1996.03.13

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