Limits to etch resistance for 193-nm single-layer resists

Limits to etch resistance for 193-nm single-layer resists

著者名:

Kunz,R.R. ( MIT Lincoln Lab. )

掲載資料名:

Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

2724

発行年:

1996

開始ページ:

365

終了ページ:

376

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819421005 [0819421006]

言語:

英語

請求記号:

P63600/2724

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019331
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Technology and Processing
回次:	1996 : 13th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1996.03.11-1996.03.13

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1 国際会議録 193-nm single-layer positive resists: building etch resistance into a high-resolution imaging system R.D. Allen, G.M. Wallraff, R.A. DiPietro, D.C. Hofer, R.R. Kunz Society of Photo-optical Instrumentation Engineers	7 国際会議録 193-nm lithography Rothschild,M., Forte,A.R., Horn,M.W., Kunz,R.R., Palmateer,S.C., Sedlacek,J.H.C. SPIE-The International Society for Optical Engineering
2 国際会議録 Protecting groups for 193-nm photoresists Allen,R.D., Sooriyakumaran,R., Opitz,J., Wallraff,G.M., DiPietro,R.A., Breyta,G., Hofer,D.C., Kunz,R.R., Jayaraman,S., … SPIE-The International Society for Optical Engineering	8 国際会議録 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers Sooriyakumaran,R., Fenzel-Alexander,D., Brock,P.J., Larson,C.E., DiPietro,R.A., Wallraff,G.M., Hofer,D.C., Dawson,D.J., … SPIE - The International Society for Optical Engineering
3 国際会議録 Design Considerations for 193-nm Positive Resists Allen, Robert D., Wan, I- Y., Wallraff, Gregory M., DiPietro, Richard A., Hofer, Donald C., Kunz, Roderick R. American Chemical Society	9 国際会議録 Optimization of a 193-nm silylation process for sub-0.25-µm lithography S.C. Palmateer, R.R. Kunz, M.W. Horn, A.R. Forte, M. Rothschild Society of Photo-optical Instrumentation Engineers
4 国際会議録 Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm Opitz,J., Allen,R.D., Wallow,T.I., Wallraff,G.M., Hofer,D.C. SPIE-The International Society for Optical Engineering	10 国際会議録 New approaches to production-worthy 193-nm photoresists based on acrylic copolymers Wallow,T.I., Allen,R.D., Opitz,J., Dipietro,R.A., Brock,P.J., Sooriyakumaran,R., Hofer,D.C. SPIE-The International Society for Optical Engineering
5 国際会議録 Role of photoacid structure on the performance of 193-nm resists Allen,R.D., Opitz,J., Larson,C.E., DiPietro,R.A., Breyta,G., Hofer,D.C. SPIE-The International Society for Optical Engineering	11 国際会議録 Progress in 193-nm single layer resists: the role of photoacid generator structure on the performance of positive resists Allen, Robert D., Opitz, Juliann, Larson, Carl E., Wallow, Thomas I., DiPietro, Richard A., Breyta, Gregory, … American Chemical Society
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