Chemically amplified negative-tone deep-UV photoresist based on poly(alkoxy styrenes)containing acetal groups
- 著者名:
Park,J.-H. ( Korea Kumho Petrochemical Co.,Ltd. ) Kim,S.-J. Kim,J.-H. Seo,D.-C. Kim,K.-D. Park,S.-Y. Lee,H. - 掲載資料名:
- Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2724
- 発行年:
- 1996
- 開始ページ:
- 287
- 終了ページ:
- 295
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819421005 [0819421006]
- 言語:
- 英語
- 請求記号:
- P63600/2724
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
American Chemical Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |