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Lithographic performance of an environmentally stable chemically amplified photoresist(ESCAP)

著者名:
Conley,W.E. ( IBM Microelectronics )
Breyta,G.
Brunsvold,W.R.
DiPietro,R.A.
Hofer,D.C.
Holmes,S.J.
Ito,H.
Nunes,R.
Fichtl,G.
Hagerty,P.
Thackeray,J.W.
さらに 6 件
掲載資料名:
Advances in resist technology and processing XIII : 11-13 March 1996, San Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
2724
発行年:
1996
開始ページ:
34
終了ページ:
60
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819421005 [0819421006]
言語:
英語
請求記号:
P63600/2724
資料種別:
国際会議録

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