Effects of various RIE process-induced damages on MOSFET characteristics
- 著者名:
Min,B.W. ( Univ.of Texas/Austin ) Han,L.K. Joshi,A.B. Mann,R. Chung,L. Kwong,D.-L. - 掲載資料名:
- Microelectronic Manufacturing Yield, Reliability, and Failure Analysis
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2635
- 発行年:
- 1995
- 開始ページ:
- 156
- 終了ページ:
- 165
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420015 [0819420018]
- 言語:
- 英語
- 請求記号:
- P63600/2635
- 資料種別:
- 国際会議録
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