Meeting advanced pattern inspection system requirements for 0.25-ヲフm technology and beyond
- 著者名:
- Trafas,B.M. ( Tencor Instruments )
- Bennett,M.H.
- Godwin,M.
- 掲載資料名:
- Microelectronic Manufacturing Yield, Reliability, and Failure Analysis
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 2635
- 発行年:
- 1995
- 開始ページ:
- 50
- 終了ページ:
- 55
- 出版情報:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819420015 [0819420018]
- 言語:
- 英語
- 請求記号:
- P63600/2635
- 資料種別:
- 国際会議録
類似資料:
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
国際会議録
Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ヲフm Technology
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
国際会議録
Critical dimension photomask metrology tool requirements for 0.25-ヲフm and future microlithography
SPIE-The International Society for Optical Engineering |