Material design and development for aqueous base compatible high-performance deep UV negative-tone resists

Material design and development for aqueous base compatible high-performance deep UV negative-tone resists

著者名:

Varanasi, Pushkara Rao ( IBM Microelectronics )

Ito, Hiroshi

Brock, Phil

Breyta, Gregory

Brunsvold, William R.

Katnani, Ahmad D.

さらに 1 件

掲載資料名:

Micro- and nanopatterning polymers

シリーズ名:

ACS symposium series

シリーズ巻号:

706

発行年:

1998

開始ページ:

320

終了ページ:

336

出版情報:

Washington, DC: American Chemical Society

ISSN:

00976156

ISBN:

9780841235816 [0841235813]

言語:

英語

請求記号:

A05800/706

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019278
シリーズID:	PA00000004
会議名:	ACS National Meeting
回次:	214th
会議開催地:	Las Vegas, NV, USA
会議開催年:	1997.09.07-1997.09.11

類似資料:

1 国際会議録 IBM-JSR 193-nm negative tone resist: polymer design, material properties, and lithographic performance Patel, K.S., Lawson, M.C., Varanasi, P.R., Medeiros, D.R., Wallraff, G.M., Brock, P.J., DiPietro, R.A., Nishimura, Y., … SPIE - The International Society of Optical Engineering	7 国際会議録 Development of high-performance negative-tone resists for 193-nm lithography Hattori, T., Yokoyama, Y., Kimura, K., Yamanaka, R., Tanaka, T., Fukuda, H. SPIE-The International Society for Optical Engineering
2 国際会議録 Dual-Tone and Aqueous Base Developable Negative Resists Based on Acid-Catalyzed Dehydration Ito, Hiroshi, Maekawa, Yasunari American Chemical Society	8 国際会議録 "193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform … Kajita,T., Nishimura,Y., Yamamoto,M., Ishii,H., Soyano,A., Kataoka,A., Slezak,M., Shimizu,M., Varanasi,P.R., … SPIE-The International Society for Optical Engineering
3 国際会議録 Chemistry of ketal resist system and its lithographic performance Huang, Wu-Song, Lee, Kim Y., Bantu, Rao, Kwong, Ranee, Katnani, Ahmad, Khojasteh, Mahmoud, Brunsvold, William, Holmes, … American Chemical Society	9 国際会議録 193-nm negative resist based on acid-catalyzed elimination of polar molecules Sooriyakumaran, R., Davis, B.W., Larson, C.E., Brock, P.J., DiPietro, R.A., Wallow, T.I., Connor, E.F., Sundberg, L.K., … SPIE - The International Society of Optical Engineering
4 国際会議録 PHS with inert blocking groups for DUV negative resist Brunsvold,W.R., Conley,W., Varanasi,P.R., Khojasteh,M., Patel,N.M., Molless,A.F., Neisser,M.O., Breyta,G. SPIE-The International Society for Optical Engineering	10 国際会議録 Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins) Varanasi, P. R., Maniscalco, J., Mewherter, A. M., Lawson, M. C., Jordhamo, G., Allen, R. D., Opitz, J., Ito, H., … SPIE - The International Society of Optical Engineering
5 国際会議録 Effects of crosslinking agent on lithographic performance of negative-tone resists based on poly(p-hydroxystyrene) Lin,Q., Katnani,A.D., Willson,C.G. SPIE-The International Society for Optical Engineering	11 国際会議録 Polarity Change for the Design of Chemical Amplification Resists Ito, Hiroshi American Chemical Society
6 国際会議録 Acid-sensitive arylether-protected poly(4-hydroxystyrene) derivatives for chemically amplified deep-UV positive resists Varanasi,P.R., Cornett,K.M., Katnani,A.D. SPIE-The International Society for Optical Engineering	12 国際会議録 The Annealing Concept for Environmental Stabilization of Chemical Amplification Resists Ito, Hiroshi, Breyta, Greg, Hofer, Donald C., Sooriyakumaran, R. American Chemical Society

1

2

3

4

5

6

7

8

9

10

11

12