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0.1-ｦﾌm high-aspect-ratio pattern replication and linewidth control

著者名:
Chen,Z. ( Ctr. for X-ray Lithography/Univ.of Wisconsin-Madison )
Vladimirsky,Y. ( Ctr. for X-ray Lithography/Univ.of Wisconsin-Madison )
Cerrina,F. ( Ctr. for X-ray Lithography/Univ.of Wisconsin-Madison )
Lai,B.P. ( Argonne National Lab. )
Yun,W. ( Argonne National Lab. )
Gluskin,E.S. ( Argonne National Lab. )
さらに 1 件
掲載資料名:
Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3331
発行年:
1998
開始ページ:
591
終了ページ:
600
出版情報:
Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819427762 [0819427764]
言語:
英語
請求記号:
P63600/3331
資料種別:
国際会議録

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