Development of SiO2/c-Si bilayer e-beam resist process and its application for 10-nm-scale MIM junctions
- 著者名:
Gorwadkar,S. ( Electrotechnical Lab. (Japan) and New Energy and Industrial Technology Development Organization (Japan) ) Wada,T. ( Electrotechnical Lab. (Japan) ) Shirakashi,J. ( Electrotechnical Lab. (Japan) ) Hiroshima,H. ( Electrotechnical Lab. (Japan) ) Ishii,K. ( Electrotechnical Lab. (Japan) ) Komuro,M. ( Electrotechnical Lab. (Japan) ) - 掲載資料名:
- Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3331
- 発行年:
- 1998
- 開始ページ:
- 359
- 終了ページ:
- 368
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427762 [0819427764]
- 言語:
- 英語
- 請求記号:
- P63600/3331
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
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MRS-Materials Research Society |
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10
国際会議録
Positive photosensitive polyimide synthesized by block-copolymerization for KrF lithography
SPIE - The International Society for Optical Engineering | |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
MRS - Materials Research Society |
SPIE-The International Society for Optical Engineering |