Mixed-proximity holographic mask technology for 50-nm VLSI by x-ray lithography

Mixed-proximity holographic mask technology for 50-nm VLSI by x-ray lithography

著者名:

Burge,R.E. ( Univ.of Cambridge (UK) and King's College London (UK) )
Knauer,J.N. ( Univ.of Cambridge (UK) )
Yuan,X.-C. ( Univ.of Cambridge (UK) and King's College London (UK) )
Powell,K. ( King's College London (UK) )

掲載資料名:

Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3331

発行年:

1998

開始ページ:

280

終了ページ:

290

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427762 [0819427764]

言語:

英語

請求記号:

P63600/3331

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019241
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	1998 : 2nd
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

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