Photomask in-plane distortion induced during e-beam patterning

Photomask in-plane distortion induced during e-beam patterning

著者名:

Shamoun,B. ( Univ.of Wisconsin/Madison )
Sprague,M.A. ( Univ.of Colorado/Boulder )
Engelstad,R.L. ( Univ.of Wisconsin/Madison )
Cerrina,F. ( Univ.of Wisconsin/Madison )

掲載資料名:

Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3331

発行年:

1998

開始ページ:

275

終了ページ:

279

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427762 [0819427764]

言語:

英語

請求記号:

P63600/3331

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019241
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Emerging Lithographic Technologies
回次:	1998 : 2nd
会議開催地:	Santa Clara, CA, USA
会議開催年:	1998.02.23-1998.02.25

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