Characterization of the accuracy of EUV phase-shifting point diffraction interferometry

著者名:

Naulleau,P. ( Lawrence Berkeley National Lab. )

Goldberg,K.A. ( Lawrence Berkeley National Lab. )

Lee,S.H. ( Lawrence Berkeley National Lab. and Univ.of California/Berkeley )

Chang,C. ( Lawrence Berkeley National Lab. and Univ.of California/Berkeley )

Bresloff,C.J. ( Lawrence Berkeley National Lab. )

Batson,P.J. ( Lawrence Berkeley National Lab. )

Attwood,D.T.,Jr. ( Lawrence Berkeley National Lab. and Univ.of California/Berkeley )

Bokor,J. ( Lawrence Berkeley National Lab. and Univ.of California/Berkeley )

さらに 3 件

掲載資料名:

Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3331

発行年:

1998

開始ページ:

114

終了ページ:

123

出版情報:

Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819427762 [0819427764]

言語:

英語

請求記号:

P63600/3331

資料種別:

国際会議録