High-power extreme-ultraviolet source based on gas jets
- 著者名:
- Kubiak,G.D. ( Sandia National Labs. )
- Bernardez II,L.J. ( Sandia National Labs. )
- Krenz,K.D. ( Sandia National Labs. )
- 掲載資料名:
- Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3331
- 発行年:
- 1998
- 開始ページ:
- 81
- 終了ページ:
- 89
- 出版情報:
- Bellingham, Wash., USA: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819427762 [0819427764]
- 言語:
- 英語
- 請求記号:
- P63600/3331
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
8
国際会議録
Development of compact extreme ultraviolet interferometry for on-line testing of lithography cameras
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |