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Furnace annealing of ion implanted polycrystalline silicon

著者名:
  • Tandon, J.L. ( Department of Communication and Electronic Engineering, RMIT )
  • Harrison, H.B. ( Department of Communication and Electronic Engineering, RMIT )
  • Neoh, C.L. ( Department of Communication and Electronic Engineering, RMIT )
  • Short, K.T. ( Department of Communication and Electronic Engineering, RMIT )
  • Williams, J.S. ( Department of Communication and Electronic Engineering, RMIT )
掲載資料名:
Grain boundaries in semiconductors : proceedings of the Materials Research Society annual meeting, November 1981, Boston Park Plaza Hotel, Boston, Massachusetts, U.S.A.
シリーズ名:
Materials Research Society symposia proceedings
シリーズ巻号:
5
発行年:
1982
開始ページ:
317
終了ページ:
323
出版情報:
New York: North-Holland
ISSN:
02729172
ISBN:
9780444006974 [0444006974]
言語:
英語
請求記号:
M23500/5
資料種別:
国際会議録

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