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High-accuracy characterization of antireflective coatings and photoresists by spectroscopic ellipsometry:a new tool for 300-mm-wafer technology

著者名:
掲載資料名:
In-line characterization, yield reliability, and failure analysis in microelectronics manufacturing : 19-21 May 1999, Edinburgh, Scotland
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3743
発行年:
1999
開始ページ:
4
終了ページ:
15
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819432230 [0819432237]
言語:
英語
請求記号:
P63600/3743
資料種別:
国際会議録

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