Blank Cover Image

Measurement of pitch dependency of overlay errors under OAI by using an electric CD measurement technique

著者名:
掲載資料名:
Optical microlithography XII : 17-19 March 1999, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3679
発行年:
1999
巻:
Part2
開始ページ:
1170
終了ページ:
1174
出版情報:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431530 [0819431532]
言語:
英語
請求記号:
P63600/3679
資料種別:
国際会議録

類似資料:

1 国際会議録 Patterning 220-nm pitch DRAM patterns by using double mask exposure

Nam,D., Seong,N., Cho,H., Moon,J., Lee,S.

SPIE - The International Society for Optical Engineering
7 国際会議録 study of critical dimension and overlay measurement methodology using SEM image analysis for process control [6152-91]

Lee, T. Y., Lee, B. H., Chin, S. B., Cho, Y. S, Hong, J. S., Song, C. L

SPIE - The International Society of Optical Engineering
2 国際会議録 Interfield sampling method dependency of overlay and global alignment

Hong,J., Lee,J., Cho,H., Moon,J., Lee,S.

SPIE - The International Society for Optical Engineering
8 国際会議録 Fabrication and Electrical Transport Properties of CVD Grown Silicon Carbide Nanowires (SiC NWs) for Field Effect Transistor

Seong, H.K., Lee, S.Y., Choi, H.J., Kim, T.H., Cho, N.K., Nahm, K.S., Lee, S.K.

Trans Tech Publications
3 国際会議録 Measurement of lens aberration by using in-situ interferometer and classification of lens for correct application

Seong,N., Yeo,G., Cho,H., Moon,J.

SPIE - The International Society for Optical Engineering
9 国際会議録 Challenge to 0.13-ｦﾌm device patterning using KrF

Kim,I.-S., Lee,J.-H., Cha,D.-H., Park,J.-S., Cho,H.-K., Moon,J.-T.

SPIE - The International Society for Optical Engineering
4 国際会議録 Statistical analysis of CD-SEM measurement and process control in the indistinguishable multi-process patterns [6152-100]

Yang, D. S., Jung, M. H., Lee, Y. M., Koh, C. W., Yeo, G. S., Woo, S. G., Cho, H. K., Moon, J. T.

SPIE - The International Society of Optical Engineering
10 国際会議録 Analysis of mask CD error by dose modulation for fogging effect

Lee, H., Yang, S.-H., Kim, B.-G., Moon, S.-Y., Choi, S.-W., Yoon, H.-S., Han, W.-S.

SPIE - The International Society of Optical Engineering
5 国際会議録 Differences in pattern displacement error under different illumination conditions

Seong,N.-G., Kye,J.-W., Kang,H.-Y., Moon,J.-T.

SPIE-The International Society for Optical Engineering
11 国際会議録 Defect inspection of EUVmask blank using confocal microscopy: simulation and experiment [6151-49]

Kim, S. S., Park, J., Chalykh, R., Kang, J., Lee, S., Woo, S. G., Cho, H. K., Moon, J. T.

SPIE - The International Society of Optical Engineering
6 国際会議録 Compensation of intrafield registration error caused by process properties in optical lithography

Lee,T.-G., Moon,S.-C., Lee,H.-M., Kim,J.-S., Lee,C.-S., Kim,H.-Y., Park,H.-K.

SPIE-The International Society for Optical Engineering
12 国際会議録 Electrical defect SEM review under the various electric circumstances on SAC layer

Lee, T.Y., Whan, N.-K., Lee, B.H., Chin, S.-B., Cho, D.H., Choi, J.I., Hur, S.S., Ko, K.H., Yeo, J.-H.

SPIE - The International Society of Optical Engineering
1
 
2
 
3
 
4
 
5
 
6
 
7
 
8
 
9
 
10
 
11
 
12