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Application of a new approach to optical proximity correction

著者名:
Rosenbusch,A. ( Sigma-C GmbH )
Hourd,A.C.
Juffermans,C.A.
Kirsch,H.
Lalanne,F.P.
Maurer,W.
Romeo,C.
Ronse,K.
Schiavone,P.
Simecek,M.
Toublan,O.
Vermeuien,T.
Watson,J.C.
Ziegler,W.
さらに 9 件
掲載資料名:
Optical microlithography XII : 17-19 March 1999, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3679
発行年:
1999
巻:
Part2
開始ページ:
639
終了ページ:
647
出版情報:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431530 [0819431532]
言語:
英語
請求記号:
P63600/3679
資料種別:
国際会議録

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