ArF step-and-scan exposure system for 0.15-ヲフm and 0.13-ヲフm technology nodes
- 著者名:
Mulkens,J. ( ASM Lithography BV ) Stoeldraijer,J.M. Davies,G. Dierichs,M. Heskamp,B. Moers,M.H. George,R.A. Roempp,O. Glatzel,H. Wagner,C. Pollers,I. Jaenen,P. - 掲載資料名:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3679
- 発行年:
- 1999
- 巻:
- Part1
- 開始ページ:
- 506
- 終了ページ:
- 521
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- 言語:
- 英語
- 請求記号:
- P63600/3679
- 資料種別:
- 国際会議録
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11
国際会議録
Proposal of a composite phase-shifting mask for 0.15-ヲフm hole-pattern delineation using KrF exposure
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