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Customized off-axis illumination aperture filtering for sub-0.18-ｦﾌm KrF Lithography

著者名:
Hsia,C.-C. ( Industrial Technology Research Institute )
Gau,T.-S.
Yang,C.-H.
Liu,R.-C.
Chang,C.-H.
Chen,L.-J.
Wang,C.-M.
Chen,J.F.
Smith,B.W.
Hwang,G.-W.
Lay,J.-W.
Goang,D.-Y.
さらに 7 件
掲載資料名:
Optical microlithography XII : 17-19 March 1999, Santa Clara, California
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3679
発行年:
1999
巻:
Part1
開始ページ:
427
終了ページ:
434
出版情報:
Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819431530 [0819431532]
言語:
英語
請求記号:
P63600/3679
資料種別:
国際会議録

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