Resolution and DOF improvement through the use of square-shaped illumination

Resolution and DOF improvement through the use of square-shaped illumination

著者名:

Smith,B.W. ( Rochester Institute of Technology )
Zavyalova,L.
Smith,S.G.
Petersen,J.S.

掲載資料名:

Optical microlithography XII : 17-19 March 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3679

発行年:

1999

巻:

Part1

開始ページ:

408

終了ページ:

419

出版情報:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431530 [0819431532]

言語:

英語

請求記号:

P63600/3679

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019002
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	1999 : 12th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.03.17-1999.03.19

類似資料:

1 国際会議録 Illumination pupil filtering using modified quadrupole apertures Smith,B.W., Zavyalova,L., Petersen,J.S. SPIE-The International Society for Optical Engineering	7 国際会議録 Assessment of a hypothetical road map that extends optical lithography through the 70-nm technology node Petersen,J.S., McCallum,M., Kachwala,N., Socha,R.J., Chen,J.F., Laidig,T.L., Smith,B.W., Gordon,R.L., Mack,C.A. SPIE - The International Society for Optical Engineering
2 国際会議録 Image enhancement through square illumination shaping Smith, B.W., Vandenberghe, G. SPIE-The International Society for Optical Engineering	8 国際会議録 Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node Petersen,J.S., McCallum,M., Kachwala,N., Socha,R.J., Chen,J.F., Laidig,T.L., Smith,B.W., Gordon,R.L., Mack,C.A. SPIE - The International Society for Optical Engineering
3 国際会議録 In-situ aberration monitoring using phase wheel targets Zavyalova, L.V., Smith, B.W., Suganaga, T., Matsuura, S., Itani, T., Cashmore, J.S. SPIE - The International Society of Optical Engineering	9 国際会議録 Aberration evaluation and tolerancing of 193-nm lithographic objective lenses Smith,B.W., Webb,J.E., Petersen,J.S., Meute,J. SPIE-The International Society for Optical Engineering
4 国際会議録 Optical extension at the 193-nm wavelength Zandbergen,P., McCallum,M., Amblard,G.R., Domke,W.-D., Smith,B .W., Zavyalova,L., Petersen,J.S. SPIE - The International Society for Optical Engineering	10 国際会議録 "Mutually optimizing resolution enhancement techniques: illumination, APSM, assist feature OPC, and gray bars" Smith,B.W. SPIE-The International Society for Optical Engineering
5 国際会議録 Revalidation of the Rayleigh resolution and DOF limits Smith,B.W. SPIE-The International Society for Optical Engineering	11 国際会議録 Design and development of thin film materials for 157-nm and VUV wavelengths:APSM,binary masking,and optical coatings applications Smith,B.W., Bourov,A., Zavyalova,L., Cangomi,M. SPIE - The International Society for Optical Engineering
6 国際会議録 Correction of 157-nm lens based on phase ring aberration extraction method Meute, J., Rich, G.K., Conley, W., Smith, B.W., Zavyalova, L.V., Cashmore, J.S., Ashworth, D., Webb, J.E., Rich, L. SPIE - The International Society of Optical Engineering	12 国際会議録 Benefiting from polarization effects on high-NA imaging Smith, B.W., Zavyalova, L.V., Estroff, A. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12