Optical extension at the 193-nm wavelength
- 著者名:
Zandbergen,P. ( International SEMATECH ) McCallum,M. Amblard,G.R. Domke,W.-D. Smith,B .W. Zavyalova,L. Petersen,J.S. - 掲載資料名:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3679
- 発行年:
- 1999
- 巻:
- Part1
- 開始ページ:
- 310
- 終了ページ:
- 319
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- 言語:
- 英語
- 請求記号:
- P63600/3679
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
193-nm photoresists at 130-nm node:which lithographic performances for which chemical platform?
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |