CD uniformity consideration for DUV step and scan tools
- 著者名:
Seltmann,R. ( Advanced Micro Devices CmbH ) Minvielle,A.M. Spence,C.A. Muehle,S. Capodieci,L. Nguyen,K.B. - 掲載資料名:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3679
- 発行年:
- 1999
- 巻:
- Part1
- 開始ページ:
- 239
- 終了ページ:
- 249
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- 言語:
- 英語
- 請求記号:
- P63600/3679
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
5
国際会議録
Extending the limits of i-line lithography for via layers and minimization of dense-iso bias
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |