Characterization of CD control for sub-0.18-ｦﾌm lithographic patterning | 東京工業大学附属図書館文献データベース

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Characterization of CD control for sub-0.18-ｦﾌm lithographic patterning

著者名:

Sturtevant,J.L. ( Motorola )

さらに 6 件

掲載資料名:

Optical microlithography XII : 17-19 March 1999, Santa Clara, California

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3679

発行年:

1999

巻:

Part1

開始ページ:

220

終了ページ:

227

出版情報:

Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819431530 [0819431532]

言語:

英語

請求記号:

P63600/3679

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00019002
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical microlithography
回次:	1999 : 12th
会議開催地:	Santa Clara, CA, USA
会議開催年:	1999.03.17-1999.03.19

類似資料:

1 国際会議録 Full-field CD control for sub-0.20-ｦﾌm patterning Sturtevant,J.L., Allgair,J., Barrick,M.W., Fu,C., Green,K.G., Hershey,R.R., Litt,L.C., Maltabes,J.G., Nelson,C., … SPIE-The International Society for Optical Engineering	7 国際会議録 Implementation of spectroscopic critical dimension (SCD) (TM) for gate CD control and stepper characterization Allgair,J.A., Benoit,D.C., Drew,M., Hershey,R.R., Litt,L.C., Herrera,P.P., Whitney,U.K., Guevremont,M., Levy,A., … SPIE-The International Society for Optical Engineering
2 国際会議録 Implementation of a closed-loop CD and overlay controller for sub-0.25-ｦﾌm patterning Sturtevant,J.L., Weilemann,M.R., Green,K.G., Dwyer,J., Robertson,E., Hershey,R.R. SPIE-The International Society for Optical Engineering	8 国際会議録 Line-edge roughness in sub-0.18-ｦﾌm resist patterns Palmateer,S.C., Cann,S.G., Curtin,J.E., Doran,S.P., Eriksen,L.M., Forte,A.R., Kunz,R.R., Lyszczarz,T.M., Stern,M.B., … SPIE-The International Society for Optical Engineering
3 国際会議録 Design,reticle,and wafer OPC manufacturability for the 0.18-ｦﾌm lithography generation Lucas,K.D., McCallum,M., Falch,B.J., Wood,J.L., Kalk,F.D., Henderson,R.K., Russell,D.R. SPIE - The International Society for Optical Engineering	9 国際会議録 Mask CD control requirement at 0.18-ｦﾌm design rules for 193-nm lithography Yan,P., Langston,J.C. SPIE-The International Society for Optical Engineering
4 国際会議録 Toward a unified advanced CD-SEM specification for sub-0.18-ｦﾌm technology Allgair,J., Archie,C.N., Banke,W., Bogardus,H., Griffith,J.E., Marchman,H.M., Postek,M.T., Saraf,L.H., Schlesinger,J.E., … SPIE-The International Society for Optical Engineering	10 国際会議録 Practicing extension of 248-nm DUV optical lithography using trim-mask PSM Kling,M.E., Cave,N., Falch,B.J., Fu,C.-C., Green,K.G., Lucas,K.D., Roman,B.J., Reich,A.J., Sturtevant,J.L., Tian,R., … SPIE - The International Society for Optical Engineering
5 国際会議録 Benchmarking of advanced CD-SEMs against the new unified specification for sub-0.18-ｦﾌm lithography Deleporte,A.G., Allgair,J., Archie,C.N., Banke,G.W., Postek,M.T., Schlesinger,J.E., Vladar,A.E., Yanof,A.W. SPIE - The International Society for Optical Engineering	11 国際会議録 Prediction of 0.18-ｦﾌm CMOS technology performance using tuned device simulation Nandakumar,M., Rodder,M., Chen,I.-C. SPIE-The International Society for Optical Engineering
6 国際会議録 0.25-ｦﾌm logic manufacturability using practical 2D optical proximity correction Kling,M.E., Lucas,K.D., Reich,A., Roman,B.J., Chuang,H., Gilbert,P.V., Grobman,W.D., Travis,E.O., Tsui,P., Vuong,T., … SPIE-The International Society for Optical Engineering	12 国際会議録 New methodology of simulating pocket-implanted sub-0.18-ｦﾌm CMOS Mehrotra,M., Hu,J.C., Nandakumar,M., Chattenee,A., Rodder,M., Chen,I.-C. SPIE-The International Society for Optical Engineering

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