Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results
- 著者名:
Socha,R.J. ( National Semiconductor Corp. ) Shi,X. Holman,K.C. Dusa,M.V. Conley,W. Petersen,J.S. Chen,J.F. Laidig,T.L. Wampler,K.E. Caldwell,R.F. Chu,M.C. Su,C. Huang,K. Chen,C. Le,C. Pierrat,C. Su,B. - 掲載資料名:
- Optical microlithography XII : 17-19 March 1999, Santa Clara, California
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 3679
- 発行年:
- 1999
- 巻:
- Part1
- 開始ページ:
- 38
- 終了ページ:
- 54
- 出版情報:
- Bellingham, Wash., USA: SPIE - The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431530 [0819431532]
- 言語:
- 英語
- 請求記号:
- P63600/3679
- 資料種別:
- 国際会議録
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