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Materials design and lithographic performance of maleic anhydride/cycloolefin copolymer for ArF resist

著者名:
Park,J.-H. ( Korea Kumho Petrochemical Co.,Ltd. )
Kim,J.-Y.
Seo,D.-C.
Park,S.-Y.
Lee,H.
Kim,S.-J.
Jung,J.-C.
Baik,K.-H.
さらに 3 件
掲載資料名:
Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
3999
発行年:
2000
巻:
Part2
開始ページ:
1163
終了ページ:
1170
出版情報:
Bellingham, Wash.: SPIE - The International Society for Optical Engineering
ISSN:
0277786X
ISBN:
9780819436177 [0819436178]
言語:
英語
請求記号:
P63600/3999
資料種別:
国際会議録

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