Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes) | 東京工業大学附属図書館文献データベース

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Progress toward developing high-performance 193-nm single-layer positive resist based on functionalized poly(norbornenes)

著者名:

Varanasi,P.R. ( IBM Microelectronics Div. )

さらに 9 件

掲載資料名:

Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

3999

発行年:

2000

巻:

Part2

開始ページ:

1157

終了ページ:

1162

出版情報:

Bellingham, Wash.: SPIE - The International Society for Optical Engineering

ISSN:

0277786X

ISBN:

9780819436177 [0819436178]

言語:

英語

請求記号:

P63600/3999

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00018975
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in resist technology and processing
回次:	2000 : 17th
会議開催地:	Santa Clara, CA, USA
会議開催年:	2000.02.28-2000.03.01

類似資料:

1 国際会議録 "193-nm single-layer resist materials: total consideration of design, physical properties, and lithographic performances on all major alicyclic platform … Kajita,T., Nishimura,Y., Yamamoto,M., Ishii,H., Soyano,A., Kataoka,A., Slezak,M., Shimizu,M., Varanasi,P.R., … SPIE-The International Society for Optical Engineering	7 国際会議録 ArF resist for contact hole application Chen,K.-J.R., Lawaon,M.C., Hughes,T., Brunsvld,W.R., Varanasi,P.R., Keller,R., Jordhamo,G.M. SPIE-The International Society for Optical Engineering
2 国際会議録 "IBM 193-nm bilayer resist: materials, lithographic performance, and optimization" Kwong,R.W., Varanasi,P.R., Lawson,M.C., Hughes,T., Jordhamo,G.M., Khojasteh,M., Mahorowala,A.P., Sooriyakumaran,R., … SPIE-The International Society for Optical Engineering	8 国際会議録 Rational design in cyclic olefin resists for sub-100-nm lithography Li, W., Varanasi, P.R., Lawson, M.C., Kwong, R.W., Chen, K.-J., Ito, H., Truong, H.D., Allen, R.D., Yamamoto, M., … SPIE-The International Society for Optical Engineering
3 国際会議録 Evolution of a 193-nm bilayer resist for manufacturing Kwong, R.W., Khojasteh, M., Lawson, P., Hughes, T., Varanasi, P.R., Brunsvold, B., Allen, R.D., Brock, P.J., … SPIE-The International Society for Optical Engineering	9 国際会議録 Lithographic characteristics of 193-nm resists imaged at 193 and 248 nm Opitz,J., Allen,R.D., Wallow,T.I., Wallraff,G.M., Hofer,D.C. SPIE-The International Society for Optical Engineering
4 国際会議録 Postmodification as a way to improve the lithographic performance of resist materials Li,W., Varanasi,P.R., Lawson,M.C., Hughes,T., Jordhamo,G.M., Allen,R.D., Ito,H. SPIE-The International Society for Optical Engineering	10 国際会議録 PHS with inert blocking groups for DUV negative resist Brunsvold,W.R., Conley,W., Varanasi,P.R., Khojasteh,M., Patel,N.M., Molless,A.F., Neisser,M.O., Breyta,G. SPIE-The International Society for Optical Engineering
5 国際会議録 Dissolution/swelling behavior of cycloolefin polymers in aqueous base Ito,H., Allen,R.D., Opitz,J., Wallow,T.I., Truong,H.D., Hofer,D.C., Varanasi,P.R., Jordhamo,G.M., Jayaraman,S., … SPIE - The International Society for Optical Engineering	11 国際会議録 Impact of thin resist processes on post-etch LER Mahorowala, A.P., Goldfarb, D.L., Temple, K., Petrillo, K.E., Pfeiffer, D., Babich, K., Angelopoulos, M., Gallatin, … SPIE-The International Society for Optical Engineering
6 国際会議録 Design and development of high-performance 193-nm positive resist based on functionalized poly(cyclicolefins) Varanasi, P. R., Maniscalco, J., Mewherter, A. M., Lawson, M. C., Jordhamo, G., Allen, R. D., Opitz, J., Ito, H., … SPIE - The International Society of Optical Engineering	12 国際会議録 High-performance 193-nm photoresist materials based on a new class of polymers containing spaced ester finctionalities Khojasteh, M., Chen, K.R., Kwong, R.W., Lawson, M.C., Varanasi, P.R., Patel, K.S., Kobayashi, E. SPIE-The International Society for Optical Engineering

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